AbstractIn this study, a novel, to the best of our knowledge, method of wet chemical etching of sapphire workpieces (such as optics, wafers, windows, and cones), called the sapphire advanced mitigation process (or sapphire AMP), has been developed that exposes sub-surface mechanical damage created during the optical fabrication process and significantly enhances the surface laser damage resistance (> 2×) and mechanical strength (up to ~ 2.6×). Sapphire AMP involves first treating the workpiece with a mixture of sulfuric and phosphoric acid ([H2SO4]:[H3PO4]= 1 : 3) at 220°C, followed with phosphoric acid at 160°C, then with sodium hydroxide base (NaOH) and surfactant at 40°C, and finally with a high-pressure deionized water spray rinse. Sapphire AMP has been demonstrated on both A- and C-plane sapphire workpieces. The mechanism of this etch process involves the reaction of the sapphire (Al2O3) surface with sulfuric acid (H2SO4) forming aluminum sulfate [Al2(SO4)3], which has low solubility. The high phosphoric acid content in the first and second steps of sapphire AMP results in the efficient conversion of Al2(SO4)3 to aluminum phosphate (AlPO4), which is very soluble, greatly reducing reaction product redeposition on the workpiece surface. Sapphire AMP is shown to expose sub-surface mechanical damage on the sapphiremore » Show
Authors: Steele, R. [1]; Destino, J. [2]; Wong, L. [1]; Norton, M. [1]; Laurence, T. [1]; Aracne-Ruddle, C. [1]; Miller, P. [1]; Shen, N. [1]; Feit, M. [1]; Ray, N. [1]; Carr, W. [1]; Rivers, C. [1]; Peters, V. [1]; Jeppson, S. [1]; Malone, D. [1]; Greene, W. [1]
Journal ID: ISSN 1559-128X; 995764; TRN: US2207262Grant/Contract Number: AC52-07NA27344 Resource Type: Accepted ManuscriptJournal Name: Applied OpticsAdditional Journal Information: Journal Volume: 59; Journal Issue: 6; Journal ID: ISSN 1559-128XPublisher: Optical Society of AmericaCountry of Publication: United StatesLanguage: EnglishSubject: 36 MATERIALS SCIENCE; laser damage; sapphire optics & windows; mechanical strength; advanced mitigation process; missile domes; sub-surface mechanical damage; etch morphology; anisotropic etch; sulfuric acid; phosphoric acid Citation Formats
Free Publicly Available Full Text Publisher's Version of Record Works referenced in this record: Ball-on-Ring Test Revisited journal, August 1989
Anisotropic Etching of SiC journal, January 2000
Current status of sapphire dome production conference, September 1994
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